Space vacuum processingThe unique ultra-vacuum environment of low-earth orbit space is to be utilized for vacuum processing of advanced semiconductor and superconductor materials through epitaxial thin-film growth. The quality of semiconductor single crystal (epitaxial) thin-films can be significantly enhanced in the space ultra-vacuum through the reduction of impurities. This will be accomplished by the development of the free-flying Wake Shield Facility presently being built by the Space Vacuum Epitaxy Center in conjunction with industry and NASA under a low-cost, short time commercial approach to space hardware development.
Document ID
19910034605
Acquisition Source
Legacy CDMS
Document Type
Conference Paper
Authors
Ignatiev, A. (Houston Univ. TX, United States)
Shih, H. D. (Houston Univ. TX, United States)
Daniels, M. (Houston, University TX, United States)
Sega, R. (NASA Johnson Space Center Houston, TX, United States)
Bonner, T. (Space Industries, Inc. Webster, TX, United States)