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Electron cyclotron resonance deposition of diamond-like filmsElectron cyclotron resonance (ECR) microwave plasma CVD has been developed at low pressures (0.0001 - 0.01 torr) and at ambient and high substrate temperatures (up to 750 C), to achieve large-area (greater than 4 in. diameter) depositions of diamondlike amorphous carbon (a - C:H) films. The application of a RF bias to the substrate stage, which induces a negative self-bias voltage, is found to play a critical role in determining carbon bonding configurations and in modifying the film morphology. There are two distinct types of ECR-deposited diamondlike films. One type of diamondlike film exhibits a Raman spectrum consisting of broad and overlapping, graphitic D (1360/cm, line width = 280/cm) and G (1590/cm, line width 140/cm) lines, and the other type has a broad Raman peak centered at appoximately 1500/cm. Examination of plasma species by optical emission spectroscopy shows no correlation between the CH-asterisk emission intensity and the deposition rate of diamondklike films.
Document ID
19910035579
Acquisition Source
Legacy CDMS
Document Type
Reprint (Version printed in journal)
Authors
Shing, Y. H.
(Jet Propulsion Lab., California Inst. of Tech. Pasadena, CA, United States)
Pool, F. S.
(JPL Pasadena, CA, United States)
Date Acquired
August 15, 2013
Publication Date
January 1, 1990
Publication Information
Publication: Vacuum
Volume: 41
Issue: 4-6,
ISSN: 0042-207X
Subject Category
Solid-State Physics
Accession Number
91A20202
Distribution Limits
Public
Copyright
Other

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