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Intelligent monitoring and control of semiconductor manufacturing equipmentThe use of AI methods to monitor and control semiconductor fabrication in a state-of-the-art manufacturing environment called the Rapid Thermal Multiprocessor is described. Semiconductor fabrication involves many complex processing steps with limited opportunities to measure process and product properties. By applying additional process and product knowledge to that limited data, AI methods augment classical control methods by detecting abnormalities and trends, predicting failures, diagnosing, planning corrective action sequences, explaining diagnoses or predictions, and reacting to anomalous conditions that classical control systems typically would not correct. Research methodology and issues are discussed, and two diagnosis scenarios are examined.
Document ID
19920041235
Acquisition Source
Legacy CDMS
Document Type
Reprint (Version printed in journal)
External Source(s)
Authors
Murdock, Janet L.
(NASA Ames Research Center Moffett Field, CA, United States)
Hayes-Roth, Barbara
(Stanford University CA, United States)
Date Acquired
August 15, 2013
Publication Date
December 1, 1991
Publication Information
Publication: IEEE Expert
Volume: 6
ISSN: 0885-9000
Subject Category
Cybernetics
Accession Number
92A23859
Funding Number(s)
CONTRACT_GRANT: NAG2-581
CONTRACT_GRANT: NIH-5-P41-RR-00785
Distribution Limits
Public
Copyright
Other

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