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The interaction of atomic oxygen with thin copper filmsA source of thermal, ground-state atomic oxygen has been used to expose thin copper films at a flux of 1.4 x 10 exp 17 atoms/sq cm s for times up to 50 min for each of five temperatures between 140 and 200 C. Rutherford backscattering spectroscopy was used to characterize the oxide formed during exposure. The observations are consistent with the oxide phase Cu2O. The time dependence and the temperature dependence of the oxide layer thickness can be described using oxide film growth theory based on rate limitation by diffusion. Within the time and temperature ranges of this study, the growth of the oxide layers is well described by the equation L(T,t) = 3.6 x 10 to 8th exp(- 1.1/2k sub B T)t exp 1/2, where L,T, and t are measured in angstroms, degrees Kelvin, and minutes, respectively. The deduced activation energy is 1.10 +/- 0.15 eV, with the attendant oxidation rate being greater than that for the corresponding reaction in molecular oxygen.
Document ID
19920042026
Acquisition Source
Legacy CDMS
Document Type
Reprint (Version printed in journal)
External Source(s)
Authors
Gibson, B. C.
(NASA Marshall Space Flight Center Huntsville, AL, United States)
Williams, J. R.
(NASA Marshall Space Flight Center Huntsville, AL, United States)
Fromhold, A. T., Jr.
(NASA Marshall Space Flight Center Huntsville, AL, United States)
Bozack, M. J.
(NASA Marshall Space Flight Center Huntsville, AL, United States)
Neely, W. C.
(Auburn University AL, United States)
Whitaker, Ann F.
(NASA Marshall Space Flight Center Huntsville, AL, United States)
Date Acquired
August 15, 2013
Publication Date
February 1, 1992
Publication Information
Publication: Journal of Chemical Physics
Volume: 96
ISSN: 0021-9606
Subject Category
Atomic And Molecular Physics
Accession Number
92A24650
Funding Number(s)
CONTRACT_GRANT: NAS8-36471
CONTRACT_GRANT: N6092-86-C-A226
CONTRACT_GRANT: NGT-50503
Distribution Limits
Public
Copyright
Other

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