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Visible luminescence from silicon wafers subjected to stain etchesEtching of Si in a variety of solutions is known to cause staining. These stain layers consist of porous material similar to that produced by anodic etching of Si in HF solutions. In this work, photoluminescence peaked in the red from stain-etched Si wafers of different dopant types, concentrations, and orientations produced in solutions of HF:HNO3:H2O was observed. Luminescence is also observed in stain films produced in solutions of NaNO2 in HF, but not in stain films produced in solutions of CrO3 in HF. The luminescence spectra are similar to those reported recently for porous Si films produced by anodic etching in HF solutions. However, stain films are much easier to produce, requiring no special equipment.
Document ID
19920043912
Acquisition Source
Legacy CDMS
Document Type
Reprint (Version printed in journal)
External Source(s)
Authors
Fathauer, R. W.
(Jet Propulsion Lab., California Inst. of Tech. Pasadena, CA, United States)
George, T.
(Jet Propulsion Lab., California Inst. of Tech. Pasadena, CA, United States)
Ksendzov, A.
(Jet Propulsion Lab., California Inst. of Tech. Pasadena, CA, United States)
Vasquez, R. P.
(JPL Pasadena, CA, United States)
Date Acquired
August 15, 2013
Publication Date
February 24, 1992
Publication Information
Publication: Applied Physics Letters
Volume: 60
ISSN: 0003-6951
Subject Category
Inorganic And Physical Chemistry
Accession Number
92A26536
Distribution Limits
Public
Copyright
Other

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