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Precautions toward XTEM of Si3N4/SiO2Severe difficulties are encountered in the preparation of oxidized Si3N4 specimens for XTEM transmission electromicroscopic inspection, in virtue of the extreme difference between Si3N4 and SiO2 mechanical properties. Attention is presently given to a preparation method in which an overlayer of the nitride is always occluded; this protects the oxide through most of the thinning that specimen preparation entails. An XTEM image of the oxide/nitride interface is presented.
Document ID
19920051306
Acquisition Source
Legacy CDMS
Document Type
Conference Paper
Authors
Ogbuji, Linus U. J. T.
(NASA Lewis Research Center Cleveland, OH, United States)
Date Acquired
August 15, 2013
Publication Date
January 1, 1991
Subject Category
Nonmetallic Materials
Meeting Information
Meeting: Annual Meeting of the Electron Microscopy Society of America
Location: San Jose, CA
Country: United States
Start Date: August 4, 1991
End Date: August 9, 1991
Accession Number
92A33930
Distribution Limits
Public
Copyright
Other

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