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Sputter deposition of SiC coating on silicon wafersA study is conducted of the effect of substrate temperature during coating on the properties of coated SiC films on Si wafers, using a scratch test technique. While specimen temperature during coating has little effect on deposition rate, it significantly affects the durability of the coating. Scratch test damage to both film coating and substrate decreased with increasing deposition temperature, perhaps due to the rapid diffusion of the deposited atoms.
Document ID
19920069537
Acquisition Source
Legacy CDMS
Document Type
Reprint (Version printed in journal)
External Source(s)
doi:10.1016/0956-716X(92)90341-B
Authors
Robson, M. T. (NASA Headquarters Washington, DC United States)
Blue, C. A. (NASA Headquarters Washington, DC United States)
Warrier, S. G. (NASA Headquarters Washington, DC United States)
Lin, R. Y. (Cincinnati, University OH, United States)
Date Acquired
August 15, 2013
Publication Date
September 1, 1992
Publication Information
Publication: Scripta Metallurgica et Materialia
Volume: 27
Issue: 5, Se
ISSN: 0956-716X
Subject Category
Nonmetallic Materials
Accession Number
92A52161
Distribution Limits
Public
Copyright
Other

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