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Properties Of Plasma-Deposited Amorphous Hydrogenated CarbonReport reviews experimental research on plasma-deposited films of hydrogenated amorphous carbon. Such films exhibit electrical resistivity, semi-transparency, mechanical hardness, and chemical inertness. Useful as gate dielectrics and passivating layers in semiconductor devices, insulators for metal/insulator/metal devices, and masks in nanometer lithography. Show promise as wear-resistant, hard solid lubricating coats for bearings and optical components.
Document ID
19930000216
Acquisition Source
Legacy CDMS
Document Type
Other - NASA Tech Brief
Authors
Miyoshi, Kazuhisa (NASA Lewis Research Center, Cleveland, OH.)
Pouch, John J. (NASA Lewis Research Center, Cleveland, OH.)
Alterovitz, Samuel A. (NASA Lewis Research Center, Cleveland, OH.)
Date Acquired
August 16, 2013
Publication Date
April 1, 1992
Publication Information
Publication: NASA Tech Briefs
Volume: 17
Issue: 4
ISSN: 0145-319X
Subject Category
Materials
Report/Patent Number
LEW-15095
Accession Number
93B10216
Distribution Limits
Public
Copyright
Work of the US Gov. Public Use Permitted.

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