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Preparation Of Sources For Plasma Vapor DepositionMulticomponent metal targets serving as sources of vapor for plasma vapor deposition made in modified pressureless-sintering process. By use of targets made in modified process, one coats components with materials previously plasma-sprayed or sintered but not plasma-vapor-deposited.
Document ID
19930000769
Acquisition Source
Legacy CDMS
Document Type
Other - NASA Tech Brief
Authors
Waters, William J.
(Waters (Mark H.) and Associates, Inc.)
Sliney, Hal
(NASA Lewis Research Center, Cleveland, OH.)
Kowalski, D.
(NASA Lewis Research Center, Cleveland, OH.)
Date Acquired
August 16, 2013
Publication Date
December 1, 1993
Publication Information
Publication: NASA Tech Briefs
Volume: 17
Issue: 12
ISSN: 0145-319X
Subject Category
Materials
Report/Patent Number
LEW-15343
Accession Number
93B10769
Distribution Limits
Public
Copyright
Work of the US Gov. Public Use Permitted.

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