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Electrochemical patterning of amorphous carbon on diamondThe ability to pattern ion-implantation damaged or other nondiamond carbon on a diamond substrate is useful for fabricating a variety of devices. We accomplished such patterning by an unmasked implantation into a diamond substrate followed by photolithography and a selective electrochemical etch. The use of a high resistivity medium coupled with applied biases over 50 V permitted etching without requiring contact between the substrate and an electrode. Many electrolytes gave etches that exhibit high selectivity for nondiamond carbon over both diamond and dielectrics such as photoresist. Optical, electrical, and Raman spectroscopic measurements elucidate the effects of the etch on the implanted diamond surface.
Document ID
19930043073
Acquisition Source
Legacy CDMS
Document Type
Reprint (Version printed in journal)
Authors
Marchywka, Mike
(NASA Headquarters Washington, DC United States)
Pehrsson, Pehr E.
(NASA Headquarters Washington, DC United States)
Binari, Steven C.
(NASA Headquarters Washington, DC United States)
Moses, Daniel
(U.S. Navy, Naval Research Lab. Washington, United States)
Date Acquired
August 16, 2013
Publication Date
February 1, 1993
Publication Information
Publication: Electrochemical Society, Journal
Volume: 140
Issue: 2
ISSN: 0013-4651
Subject Category
Inorganic And Physical Chemistry
Accession Number
93A27070
Distribution Limits
Public
Copyright
Other

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