Multilayer and grazing incidence X-ray/EUV optics for astronomy and projection lithography; Proceedings of the Meeting, San Diego, CA, July 19-22, 1992The present volume on multilayer and grazing incidence X-ray/EUV optics for astronomy and projection lithography discusses AXAF grazing incidence mirrors, the theory and high throughput optics of grazing incidence optics, multilayer mirror fabrication and characterization, and multilayer optics for X-ray projection lithography. Attention is given to the VETA-I X-ray detection system, a motion detection system for AXAF X-ray ground testing, image analysis of the AXAF VETA-I X-ray mirror, and optical constants from mirror reflectivities measured at synchrotrons. Topics discussed include the application of aberration theory to calculate encircled energy of Wolter I-II telescopes, W/C multilayers deposited on plastic films, nonspecular X-ray scattering from Si/Mo multilayers, and multilayer thin-film design as FUV polarizers. Also discussed are thin-film filter lifetesting results in the EUV, chromospheric and coronal observations with multilayer optics, present and future requirements of soft X-ray projection lithography, and the imaging Schwarzschild multilayer X-ray microscope.
Document ID
19930055604
Acquisition Source
Legacy CDMS
Document Type
Conference Proceedings
Authors
Hoover, Richard B. (NASA Marshall Space Flight Center Huntsville, AL, United States)
Walker, Arthur B. C., Jr. (Stanford Univ. CA, United States)
Date Acquired
August 16, 2013
Publication Date
January 1, 1993
Publication Information
Publisher: Society of Photo-Optical Instrumentation Engineers (SPIE Proceedings. Vol. 1742)
ISBN: 0-8194-0915-4
Subject Category
Optics
Report/Patent Number
SPIE-1742
Accession Number
93A39601
Distribution Limits
Public
Copyright
Other
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