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Computer modeling of a hot filament diamond deposition reactorA commercial fluid mechanics program, FLUENT, has been applied to the modeling of a hot-filament diamond deposition reactor. Streamlines and contours of constant temperature and species concentrations are obtained for practical reactor geometries and conditions. The modeling is presently restricted to two-dimensional simulations and to a chemical mechanism of ten independent homogeneous and surface reactions. Comparisons are made between predicted power consumption, substrate temperature, and concentrations of atomic hydrogen and methyl-radical with values taken from the literature. The results to date indicate that the modeling can aid in the rational design and analysis of practical reactor configurations.
Document ID
19930056621
Acquisition Source
Legacy CDMS
Document Type
Conference Paper
Authors
Kuczmarski, Maria A.
(NASA Lewis Research Center Cleveland, OH, United States)
Washlock, Paul A.
(NASA Lewis Research Center Cleveland, OH, United States)
Angus, John C.
(Case Western Reserve Univ. Cleveland, OH, United States)
Date Acquired
August 16, 2013
Publication Date
January 1, 1991
Publication Information
Publication: In: Applications of diamond films and related materials; Proceedings of the 1st International Conference, Auburn, AL, Aug. 17-22, 1991 (A93-40551 16-76)
Publisher: Elsevier
Subject Category
Chemistry And Materials (General)
Accession Number
93A40618
Distribution Limits
Public
Copyright
Other

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