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Simple, extremely low resistance contact system to n-InP that does not exhibit metal-semiconductor intermixing during sinteringContact formation to InP is plagued by the violent metal-semiconductor intermixing that takes place during the contact sintering process. We have discovered a truly unique contact system, involving Au and Ge, which is easily fabricated, which exhibits extremely low values of contact resistivity, and in which there is virtually no metal-semiconductor interdiffusion, even after extended sintering. We present a description of this contact system and suggest possible mechanisms to explain the observed behavior.
Document ID
19930058553
Acquisition Source
Legacy CDMS
Document Type
Reprint (Version printed in journal)
External Source(s)
Authors
Weizer, Victor G.
(NASA Lewis Research Center Cleveland, OH, United States)
Fatemi, Navid S.
(Sverdrup Technology, Inc. Brook Park, OH, United States)
Date Acquired
August 16, 2013
Publication Date
May 24, 1993
Publication Information
Publication: Applied Physics Letters
Volume: 62
Issue: 21
ISSN: 0003-6951
Subject Category
Electronics And Electrical Engineering
Accession Number
93A42550
Funding Number(s)
CONTRACT_GRANT: NAS3-25266
Distribution Limits
Public
Copyright
Other

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