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Ultraviolet stability and contamination analysis of Spectralon diffuse reflectance materialA detailed chemical analysis was carried out on Spectralon, a highly Lambertian, diffuse reflectance material. Results of this investigation unambiguously identified the presence of an organic (hydrocarbon) impurity intrinsic to the commercial material. This impurity could be removed by a vacuum bake-out procedure and was identified as the cause of optical changes (degradation) that occur in the material when exposed to UV light. It was found that when this impurity was removed, the Spectralon material was photochemically stable and maintained its reflectance properties even after extensive solar UV exposure.
Document ID
19930070287
Acquisition Source
Legacy CDMS
Document Type
Reprint (Version printed in journal)
Authors
Stiegman, Albert E.
(Jet Propulsion Lab., California Inst. of Tech. Pasadena, CA, United States)
Bruegge, Carol J.
(JPL Pasadena, CA, United States)
Springsteen, Arthur W.
(Labsphere, Inc. North Sutton, NH, United States)
Date Acquired
August 16, 2013
Publication Date
April 1, 1993
Publication Information
Publication: Optical Engineering
Volume: 32
Issue: 4
ISSN: 0091-3286
Subject Category
Optics
Accession Number
93A54284
Distribution Limits
Public
Copyright
Other

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