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Vector formulation for interferogram surface fittingInterferometry is an optical testing technique that quantifies the optical path difference (OPD) between a reference wave front and a test wave front based on the interference of light. Fringes are formed when the OPD is an integral multiple of the illuminating wavelength. The resultant two-dimensional pattern is called an interferogram. The function of any interferogram analysis program is to extract this OPD and to produce a representation of the test wave front (or surface). This is accomplished through a three-step process of sampling, ordering, and fitting. We develop a generalized linear-algebra vector-notation model of the interferogram sampling and fitting process.
Document ID
19930071690
Acquisition Source
Legacy CDMS
Document Type
Reprint (Version printed in journal)
Authors
Fischer, David J.
(NASA Lewis Research Center Cleveland, OH, United States)
O'Bryan, John T.
(NASA Lewis Research Center Cleveland, OH, United States)
Lopez, Robert
(NASA Lewis Research Center Cleveland, OH, United States)
Stahl, H. P.
(Rose-Hulman Inst. of Technology Terre Haute, IN, United States)
Date Acquired
August 16, 2013
Publication Date
September 1, 1993
Publication Information
Publication: Applied Optics
Volume: 32
Issue: 25
ISSN: 0003-6935
Subject Category
Optics
Accession Number
93A55687
Funding Number(s)
CONTRACT_GRANT: NAG3-1300
Distribution Limits
Public
Copyright
Other

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