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Multilayer Badges Indicate Depths Of Ion Sputter EtchesMultilayer badges devised to provide rapid, in-place indications of ion sputter etch rates. Badges conceived for use in estimating ion erosion of molybdenum electrodes used in inert-gas ion thrustors. Concept adapted to measure ion erosion in industrial sputter etching processes used for manufacturing of magnetic, electronic, and optical devices. Badge etched when bombarded by energetic ions. Badge layers exposed using mask. Contrast between layers facilitates counting of layers to determine etch depth.
Document ID
19940000373
Acquisition Source
Legacy CDMS
Document Type
Other - NASA Tech Brief
Authors
Beattie, J. R.
(Hughes Research Laboratories)
Matossian, J. N.
(Hughes Research Laboratories)
Garvin, H. L.
(Hughes Research Laboratories)
Date Acquired
August 16, 2013
Publication Date
July 1, 1994
Publication Information
Publication: NASA Tech Briefs
Volume: 18
Issue: 7
ISSN: 0145-319X
Subject Category
Physical Sciences
Report/Patent Number
LEW-15599
Accession Number
94B10373
Distribution Limits
Public
Copyright
Work of the US Gov. Public Use Permitted.

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