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Safety-Enclosure System For MOCVD Process ChamberSafety-enclosure system filled with nitrogen surrounds reaction chamber in which metallo-organic chemical vapor deposition (MOCVD) performed. Designed to protect against explosions and/or escaping toxic gases and particulates. Gas-purification subsystem ensures during loading and unloading of process materials, interior of MOCVD chamber exposed to less than 1 ppm of oxygen and less than 5 ppm of water in nitrogen atmosphere. Toxic byproducts of MOCVD process collected within inert atmosphere. Enclosure strong enough to contain any fragments in unlikely event of explosion.
Document ID
19950065202
Acquisition Source
Legacy CDMS
Document Type
Other - NASA Tech Brief
Authors
Singletery, James, Jr.
(Caltech)
Velasquez, Hugo
(Caltech)
Warner, Joseph
(Lewis Research Center)
Date Acquired
August 17, 2013
Publication Date
January 1, 1995
Publication Information
Publication: NASA Tech Briefs
Volume: 19
Issue: 1
ISSN: 0145-319X
Subject Category
Fabrication Technology
Report/Patent Number
NPO-18872
Accession Number
95B10043
Distribution Limits
Public
Copyright
Work of the US Gov. Public Use Permitted.

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