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Ion-Implanted Diamond Films and Their Tribological PropertiesThis paper reports the physical characterization and tribological evaluation of ion-implanted diamond films. Diamond films were produced by microwave plasma, chemical vapor deposition technique. Diamond films with various grain sizes (0.3 and 3 microns) and roughness (9.1 and 92.1 nm r.m.s. respectively) were implanted with C(+) (m/e = 12) at an ion energy of 160 eV and a fluence of 6.72 x 10(exp 17) ions/sq cm. Unidirectional sliding friction experiments were conducted in ultrahigh vacuum (6.6 x 10(exp -7)Pa), dry nitrogen and humid air (40% RH) environments. The effects of C(+) ion bombardment on fine and coarse-grained diamond films are as follows: the surface morphology of the diamond films did not change; the surface roughness increased (16.3 and 135.3 nm r.m.s.); the diamond structures were damaged and formed a thin layer of amorphous non-diamond carbon; the friction coefficients dramatically decreased in the ultrahigh vacuum (0.1 and 0.4); the friction coefficients decreased slightly in the dry nitrogen and humid air environments.
Document ID
19970022101
Acquisition Source
Legacy CDMS
Document Type
Reprint (Version printed in journal)
Authors
Wu, Richard L. C.
(UES, Inc. Dayton, OH United States)
Miyoshi, Kazuhisa
(NASA Lewis Research Center Cleveland, OH United States)
Korenyi-Both, Andras L.
(Calspan Corp. Cleveland, OH United States)
Garscadden, Alan
(Wright Lab. Wright-Patterson AFB, OH United States)
Barnes, Paul N.
(Wright Lab. Wright-Patterson AFB, OH United States)
Date Acquired
August 17, 2013
Publication Date
January 1, 1993
Publication Information
Publication: Surface and Coatings Technology
Publisher: Elsevier Sequoia
Volume: 62
ISSN: 0257-8972
Subject Category
Solid-State Physics
Report/Patent Number
NAS 1.15:112732
NASA-TM-112732
Accession Number
97N72081
Funding Number(s)
PROJECT: AF Proj. 2301
Distribution Limits
Public
Copyright
Public Use Permitted.
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