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Kinetics of the Reactions of IO Radicals with NO and NO2A laser flash photolysis-long path absorption technique has been employed to study the kinetics of the reactions of IO radicals with NO and NO2 as a function of temperature and pressure. The IO and NO rate coefficient is independent of pressure over the range 40-200 Torr of N2, and its temperature dependence over the range 242-359 K is adequately described by the Arrhenius expression k(sub 1) = (6.9 +/- 1.7) x 10(exp -12) exp[(328 +/- 71)/T] cu cm/(molecule.s) (errors are 2 sigma, precision only). These Arrhenius parameters are similar to those determined previously for the ClO + NO and BrO + NO reactions. The IO and NO2 association reaction is found to be in the falloff regime over the temperature and pressure ranges investigated (254-354 K and 40-750 Torr of N2). Assuming F(sub c) = 0.4 independent of temperature, a physically reasonable set of falloff parameters which adequately describe the data are k(sub 0) = 7.7 x 10(exp -31)(T/300)(exp -5.0) cm(exp 6)/(molecule(exp 2).s) and k(sub infinity) = 1.55 x 10(exp -11)cu cm/(molecule.s) independent of temperature. The IO + NO2 rate coefficients determined in this study are about a factor of 2 faster than those reported in the only previous study of this reaction.
Document ID
19980015267
Acquisition Source
Headquarters
Document Type
Reprint (Version printed in journal)
Authors
Daykin, E. P.
(Georgia Inst. of Tech. Atlanta, GA United States)
Wine, P. H.
(Georgia Inst. of Tech. Atlanta, GA United States)
Date Acquired
August 17, 2013
Publication Date
April 9, 1997
Publication Information
Publication: Laboratory Investigations of Stratospheric Halogen Chemistry
Publisher: American Chemical Society
ISSN: 0022-3654
Subject Category
Inorganic And Physical Chemistry
Funding Number(s)
CONTRACT_GRANT: NAGw-1001
CONTRACT_GRANT: NSF ATM-88-02386
Distribution Limits
Public
Copyright
Work of the US Gov. Public Use Permitted.
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