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Comparison of Contamination Model Predictions to LDEF Surface MeasurementsContaminant deposition measurements have been made on species content and depth profiles on three experiments trays from the Long Duration Exposure Facility (LDEF), Auger, Argon sputtering, Electron Spectroscopy for Chemical Analysis (ESCA) and Scanning Electron Microscopy (SEM) analysis. The integrated spacecraft environment model (ISEM) was used to predict the deposition levels of the contaminants measured on the three trays. The details of the modeling and assumptions used are presented along with the predictions for the deposition on select surfaces on the trays. These are compared to the measured results. The trays represent surfaces that have a high atomic oxygen flux, and intermediate oxygen flux, and no oxygen flux. All surfaces received significant solar Ultraviolet flux. It appears that the atomic oxygen was the primary agent that caused significant deposition to occur. Surfaces that saw significant contaminant flux solar UV and no atomic oxygen did not show any appreciable levels of observable deposition. The implications of the atom ic oxygen interaction with contaminant deposits containing silicon contaminant sources is discussed. The primary contaminant sources are DC61104 adhesive and Z306 paint. The results and interpretation of the findings have a potential significant impact on spacecraft surfaces that are exposed to solar UV and atomic oxygen in low Earth orbit.
Document ID
19990076707
Acquisition Source
Marshall Space Flight Center
Document Type
Reprint (Version printed in journal)
Authors
Gordon, Tim
(Applied Science Technologies Littleton, CO United States)
Rantanen, Ray
(ROR Enterprises Athol, ID United States)
Pippin, Gary
(Boeing Defense and Space Group Kent, WA United States)
Finckenor, Miria
(NASA Marshall Space Flight Center Huntsville, AL United States)
Date Acquired
August 19, 2013
Publication Date
January 1, 1998
Subject Category
Inorganic And Physical Chemistry
Funding Number(s)
CONTRACT_GRANT: NAS8-40581
Distribution Limits
Public
Copyright
Other

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