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Ultralow Energy Electron Attachment at Sub-Millielectron Volt ResolutionThe technique of rare-gas photoionization has been extended by use of direct laser ionization to electron energies epsilon in the range 0-100 meV, with a resolution Delta(epsilon) of 0.4-0.5 meV (FWHM). Tunable UV light at (Lambda)276 nm is produced using a pulsed Nd:YAG laser and nonlinear mixing techniques. The beam is frequency tripled in a pulsed jet of xenon. The VUV radiation, tunable at (Lambda)92 nm, is then used to photoionize Xe at its 2P(sub 1/2) threshold (single-photon ionization). The photoelectrons produced interact with admixed target gas to generate negative ions through the s-wave capture process. Recent results in electron attachment to SF(sub 6) will be reported which show resonance structure at the opening of the ground-state vibrational channels. This structure corresponds to the process of vibrational excitation + attachment, which is superimposed on the underlying s-wave (direct) capture process. It should be a general phenomenon, present in a wide variety of zero-energy electron attaching molecules.
Document ID
20000073233
Acquisition Source
Headquarters
Document Type
Preprint (Draft being sent to journal)
Authors
Chutjian, A.
(Jet Propulsion Lab., California Inst. of Tech. Pasadena, CA United States)
Kortyna, A.
(Jet Propulsion Lab., California Inst. of Tech. Pasadena, CA United States)
Darrach, M. R.
(Jet Propulsion Lab., California Inst. of Tech. Pasadena, CA United States)
Howe, P. -T.
(Jet Propulsion Lab., California Inst. of Tech. Pasadena, CA United States)
Date Acquired
August 19, 2013
Publication Date
January 1, 1999
Subject Category
Atomic And Molecular Physics
Meeting Information
Meeting: Gaseous Electronics
Location: Norfolk, VA
Country: United States
Start Date: October 5, 1999
End Date: October 8, 1999
Distribution Limits
Public
Copyright
Work of the US Gov. Public Use Permitted.

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