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Simulation and Experimental Measurements of Inductively Coupled CF4 and CF4/Ar PlasmasThe recently developed code SEMS (semiconductor equipment modeling software)is applied to the simulation of CF4 and CF4/Ar inductively coupled plasmas (ICP). This work builds upon the earlier nitrogen, transformer coupled plasma (TCP) SEMS research by demonstrating its accuracy for more complex reactive mixtures, moving closer to the realization of a virtual plasma reactor. Attention is given to the etching of and/or formation of carbonaceous films on the quartz dielectric window and diagnostic aperatures. The simulations are validated through comparisons with experimental measurements using FTIR (Fourier Transform Infrared) and UV absorption spectroscopy for CFx and SiFx neutral radicals, QMS (quadrupole mass spectrometry) for the ions, and Langmuir probe measurements of electron number density and temperature in an ICP GEC reference cell.
Document ID
20010080474
Acquisition Source
Ames Research Center
Document Type
Conference Paper
Authors
Hash, D. B.
(NASA Ames Research Center Moffett Field, CA United States)
Bose, D.
(NASA Ames Research Center Moffett Field, CA United States)
Rao, M. V. V. S.
(NASA Ames Research Center Moffett Field, CA United States)
Cruden, B. A.
(NASA Ames Research Center Moffett Field, CA United States)
Meyyappan, M.
(NASA Ames Research Center Moffett Field, CA United States)
Sharma, S. P.
(NASA Ames Research Center Moffett Field, CA United States)
Arnold, James O.
Date Acquired
August 20, 2013
Publication Date
January 11, 2000
Subject Category
Plasma Physics
Meeting Information
Meeting: 53rd Gaseous Electronics Conference
Location: Houston, TX
Country: United States
Start Date: October 24, 2000
End Date: October 27, 2000
Funding Number(s)
PROJECT: RTOP 632-10-01
CONTRACT_GRANT: NAS2-99092
Distribution Limits
Public
Copyright
Work of the US Gov. Public Use Permitted.

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