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Langmuir Probe Measurements of Inductively Coupled Plasmas in CF4/Ar/O2 MixturesFluorocarbon gases, such as CF4, and their mixtures are widely used in contemporary low-pressure and high-density plasma processing techniques. In such plasmas Langmuir probe is one of the most commonly employed diagnostic techniques to obtain electron number density (ne), electron temperature (Te), electron energy distribution function (EEDF), mean electron energy (Ee), ion number density (ni), and plasma potential (Vp). In this paper we report probe data for planar inductively coupled plasmas in CF4/O2/Ar mixtures. By varying the relative concentrations in the mixture, radial profiles of ne, ni, Te, Ee, Vp, EEDF were measured in the mid-plane of the plasma at 10 mTorr and 20 mTorr of gas pressures, and 200 W and 300 W of RF powers. Data show that ne and ni decrease with increase of CF4 content and decrease of gas-pressure but they increase with increase of RF-power, whereas Vp increases with decrease of gas-pressure and remains independent of RF-power. However, they all peak at the center of the plasma and decrease towards the edge while Te follows the other way and increases a little with increase of power. The measured EEDFs exhibit Druyvesteyn-like distribution at all pressures and powers. Data are analyzed and will be presented.
Document ID
20010089649
Acquisition Source
Ames Research Center
Document Type
Conference Paper
Authors
Rao, M. V. V. S.
(Eloret Corp. United States)
Meyyappan, M.
(NASA Ames Research Center Moffett Field, CA United States)
Sharma, S. P.
(NASA Ames Research Center Moffett Field, CA United States)
Date Acquired
August 20, 2013
Publication Date
January 24, 2000
Subject Category
Plasma Physics
Meeting Information
Meeting: 53rd Gaseous Electronics Conference
Location: Houston, TX
Country: United States
Start Date: November 24, 2000
End Date: November 27, 2000
Funding Number(s)
PROJECT: RTOP 632-10-01
Distribution Limits
Public
Copyright
Work of the US Gov. Public Use Permitted.

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