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Simulation of Gas Mixtures in RF Discharges for Nitride DepositionTungsten and titanium nitride films have long been grown by chemical vapor deposition (CVD) methods. However, there has been recent interest in low temperature growth using plasma enhanced CVD. For the present work, we focus on the radio frequency (BE) discharge characteristics of gas mixtures used in nitride deposition (for example, WF6 and ammonia). Because the radial variations for a standard 200 mm, parallel plate reactor are limited to a small zone near the edges of the electrodes, a 1-D (one-dimensional) analysis is considered. This model consists of a self-consistent, 3-D (three-dimensional) moment fluid simulation that solves the continuity, momentum, and energy equations for neutral and charged species. The results in terms of plasma structure, radical concentrations, and local deposition rate will be presented. We will also compare the 1-D results with those obtained from a 2-D hybrid plasma equipment model (HPEM) developed at the University of Illinois.
Document ID
20020050915
Acquisition Source
Ames Research Center
Document Type
Conference Paper
Authors
Hwang, Helen H.
(NASA Ames Research Center Moffett Field, CA United States)
Meyyappan, Meyya
(NASA Ames Research Center Moffett Field, CA United States)
Arnold, James O.
Date Acquired
August 20, 2013
Publication Date
January 1, 1997
Subject Category
Nonmetallic Materials
Meeting Information
Meeting: Gaseous Electronics Conference
Location: Madison, WI
Country: United States
Start Date: October 6, 1997
End Date: October 11, 1997
Sponsors: American Physical Society
Funding Number(s)
PROJECT: RTOP 632-30-34
Distribution Limits
Public
Copyright
Work of the US Gov. Public Use Permitted.

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