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A Computational Chemistry Database for Semiconductor ProcessingThe concept of 'virtual reactor' or 'virtual prototyping' has received much attention recently in the semiconductor industry. Commercial codes to simulate thermal CVD and plasma processes have become available to aid in equipment and process design efforts, The virtual prototyping effort would go nowhere if codes do not come with a reliable database of chemical and physical properties of gases involved in semiconductor processing. Commercial code vendors have no capabilities to generate such a database, rather leave the task to the user of finding whatever is needed. While individual investigations of interesting chemical systems continue at Universities, there has not been any large scale effort to create a database. In this presentation, we outline our efforts in this area. Our effort focuses on the following five areas: 1. Thermal CVD reaction mechanism and rate constants. 2. Thermochemical properties. 3. Transport properties.4. Electron-molecule collision cross sections. and 5. Gas-surface interactions.
Document ID
20020061377
Acquisition Source
Ames Research Center
Document Type
Conference Paper
Authors
Jaffe, R.
(NASA Ames Research Center Moffett Field, CA United States)
Meyyappan, M.
(NASA Ames Research Center Moffett Field, CA United States)
Arnold, J. O.
Date Acquired
August 20, 2013
Publication Date
January 1, 1998
Subject Category
Atomic And Molecular Physics
Meeting Information
Meeting: 194th Meeting of the Electrochemical Society
Location: Boston, MA
Country: United States
Start Date: November 1, 1998
End Date: November 6, 1998
Sponsors: Electrochemical Society, Inc.
Funding Number(s)
PROJECT: RTOP 632-10-01
Distribution Limits
Public
Copyright
Work of the US Gov. Public Use Permitted.

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