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Simulation Model of A Ferroelectric Field Effect TransistorAn electronic simulation model has been developed of a ferroelectric field effect transistor (FFET). This model can be used in standard electrical circuit simulation programs to simulate the main characteristics of the FFET. The model uses a previously developed algorithm that incorporates partial polarization as a basis for the design. The model has the main characteristics of the FFET, which are the current hysterisis with different gate voltages and decay of the drain current when the gate voltage is off. The drain current has values matching actual FFET's, which were measured experimentally. The input and output resistance in the model is similar to that of the FFET. The model is valid for all frequencies below RF levels. A variety of different ferroelectric material characteristics can be modeled. The model can be used to design circuits using FFET'S with standard electrical simulation packages. The circuit can be used in designing non-volatile memory circuits and logic circuits and is compatible with all SPICE based circuit analysis programs. The model is a drop in library that integrates seamlessly into a SPICE simulation. A comparison is made between the model and experimental data measured from an actual FFET.
Document ID
20020072730
Acquisition Source
Marshall Space Flight Center
Document Type
Conference Paper
Authors
MacLeod, Todd C.
(NASA Marshall Space Flight Center Huntsville, AL United States)
Ho, Fat Duen
(Alabama Univ. Huntsville, AL United States)
Russell, Larry W.
Date Acquired
August 20, 2013
Publication Date
March 13, 2002
Subject Category
Electronics And Electrical Engineering
Meeting Information
Meeting: International Joint Conference on the Applications of Ferroelectrics 2002
Location: Nara
Country: Japan
Start Date: May 28, 2002
Funding Number(s)
PROJECT: RTOP 430-04-00
Distribution Limits
Public
Copyright
Work of the US Gov. Public Use Permitted.

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