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A Comparison of MOCLD With PLD Ba(x)Sr(1-x)TiO3 Thin Films on LaAlO3 for Tunable Microwave ApplicationsHistorically, tunable dielectric devices using thin crystalline Ba(x)Sr(1-x),TiO3 (BST) films deposited on lattice-matched substrates, such as LaAlO3 have generally been grown using pulsed laser deposition (PLD). Highly oriented BST films can be grown by PLD but large projects are hampered by constraints of deposition area, deposition time and expense. The Metal-Organic Chemical Liquid Deposition (MOCLD) process allows for larger areas, faster turnover and lower cost. Several BST films deposited on LaAlO, by MOCLD have been tested in 16 GHz coupled microstrip phase shifters. They can be compared with many PLD BST films tested in the same circuit design. The MOCLD phase shifter performance of 293 degree phase shift with 53 V/micron dc bias and a figure of merit of 47 degree/dB is comparable to the most highly oriented PLD BST films. The PLD BST films used here have measured XRD full-width-at-half-maxima (FWHM) as low as 0.047 degrees. The best FWHM of these MOCLD BST films has been measured to be 0.058 degrees.
Document ID
20030066147
Acquisition Source
Glenn Research Center
Document Type
Technical Memorandum (TM)
Authors
VanKeuls, F. W.
(NASA Glenn Research Center Cleveland, OH, United States)
Mueller, C. H.
(NASA Glenn Research Center Cleveland, OH, United States)
Romanofsky, R. R.
(NASA Glenn Research Center Cleveland, OH, United States)
Warner, J. D.
(NASA Glenn Research Center Cleveland, OH, United States)
Miranda, F. A.
(NASA Glenn Research Center Cleveland, OH, United States)
Jiang, H.
(Corning Applied Technologies Woburn, MA, United States)
Date Acquired
August 21, 2013
Publication Date
August 1, 2003
Subject Category
Communications And Radar
Report/Patent Number
E-12783-1/REV1
NAS 1.15:210906/REV1
NASA/TM-2002-210906/REV1
Funding Number(s)
WBS: WBS 755-08-0B
Distribution Limits
Public
Copyright
Public Use Permitted.
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