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Fabrication of Monolithic Sapphire Membranes for High Tc Bolometer Array DevelopmentThis paper examines the effectiveness of Pt/Cr thin film masks for the architecture of monolithic membrane structures in r-plane sapphire. The development of a pinhole-free Pt/Cr composite mask that is resistant to hot H2SO4:H3PO4 etchant, will lead to the fabrication of smooth sapphire membranes whose surfaces are well-suited for the growth of low-noise high Tc films. In particular, the relationship of thermal annealing conditions on the Pt/Cr composite mask system to: (1) changes in the surface morphology and elemental concentration of the Pt/Cr thin film layers and (2) etch pit formation on the sapphire surface will be presented.
Document ID
20040031770
Acquisition Source
Goddard Space Flight Center
Document Type
Conference Paper
Authors
Pugel, D. E. (Raytheon Co. Lanham, MD, United States)
Lakew, B. (NASA Goddard Space Flight Center Greenbelt, MD, United States)
Aslam, S. (Raytheon Co. Lanham, MD, United States)
Wang, L. (Swales Aerospace Beltsville, MD, United States)
Date Acquired
August 21, 2013
Publication Date
June 10, 2003
Subject Category
Electronics And Electrical Engineering
Meeting Information
Meeting: Thermal Detectors Workshop 2003
Location: Adelphi, MD
Country: United States
Start Date: June 19, 2003
End Date: June 20, 2003
Distribution Limits
Public
Copyright
Work of the US Gov. Public Use Permitted.

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