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Taguchi Method Applied in Optimization of Shipley SJR 5740 Positive Resist DepositionTaguchi Methods of Robust Design presents a way to optimize output process performance through an organized set of experiments by using orthogonal arrays. Analysis of variance and signal-to-noise ratio is used to evaluate the contribution of each of the process controllable parameters in the realization of the process optimization. In the photoresist deposition process, there are numerous controllable parameters that can affect the surface quality and thickness of the final photoresist layer.
Document ID
20060041139
Acquisition Source
Jet Propulsion Laboratory
Document Type
Conference Paper
External Source(s)
Authors
Hui, A.
Blosiu, J. O.
Wiberg, D. V.
Date Acquired
August 23, 2013
Publication Date
February 23, 1998
Distribution Limits
Public
Copyright
Other
Keywords
Taguchi Method Shipley SJR 5740 orthogonal arrays Robust Design

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