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Non-Thermal Removal of Gaseous PollutantsThe removal of fluorine based exhaust gases such as CFC's, PFC's, NF3, and SF6 used for plasma etching of and deposition on semi-conductors is a subject of increasing interest because of safety, air pollution, and global warming issues. Conventional treatment methods for removing exhaust gas pollutants are wet scrubbing, carbon and resin adsorption, catalytic oxidation, and thermal incineration. However, there are drawbacks associated with each of these methods which include difficulties in implementation, problems with the disposal of solid and liquid pollutant waste, large water and fuel consumption, and additional pollutants such as NOx emissions which are generated in thermal incineration processes.
Document ID
20060041982
Acquisition Source
Jet Propulsion Laboratory
Document Type
Reprint (Version printed in journal)
External Source(s)
Authors
Srivastava, S.
McGowan, J. William
Chiu, K. C. Ray
Date Acquired
August 23, 2013
Publication Date
January 1, 1995
Publication Information
Publication: Journal of Vacuum Science and Technology
Distribution Limits
Public
Copyright
Other
Keywords
exhaust gases

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