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Delta-Doped High Purity Silicon UV-NIR CCDs with High QE and Low Dark CurrentDelta doping process was developed on p-channel CCDs for MIDEX-Orion and JDEM/SNAP and was applied to large format (2k x4k) CCDs. Delta doping is applied to fully-fabricated CCDs (complete with Al metallization). High QE and low dark current is demonstrated with delta doped p-channel CCDs. In-house AR coating is demonstrated. Advantages include: Delta doping enables high QE and stability across the entire spectral range attainable with silicon. Delta doping is a low temperature process and is compatible with fully-fabricated detector arrays. Same base device for Orion two channels. High radiation tolerance and no thinning requirements of high purity p-channel. CCDs are additional advantages.
Document ID
20070032834
Acquisition Source
Jet Propulsion Laboratory
Document Type
Conference Paper
External Source(s)
Authors
Hoenk, Michael
(Jet Propulsion Lab., California Inst. of Tech. Pasadena, CA, United States)
Blacksberg, Jordana
(Jet Propulsion Lab., California Inst. of Tech. Pasadena, CA, United States)
Nikzad, Shouleh
(Jet Propulsion Lab., California Inst. of Tech. Pasadena, CA, United States)
Elliott, S. Tom
(Jet Propulsion Lab., California Inst. of Tech. Pasadena, CA, United States)
Holland, Steve
(California Univ., Lawrence Berkeley National Lab. Berkeley, CA, United States)
Bebek, Chris
(California Univ., Lawrence Berkeley National Lab. Berkeley, CA, United States)
Scowen, Paul
(Arizona State Univ. AZ, United States)
Veach, Todd
(Arizona State Univ. AZ, United States)
Date Acquired
August 23, 2013
Publication Date
August 13, 2006
Subject Category
Electronics And Electrical Engineering
Distribution Limits
Public
Copyright
Other
Keywords
Orion
delta doping
p channels
Super Nova Acceleration Probe (SNAP)

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