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Mask Design for the Space Interferometry Mission Internal MetrologyThis slide presentation reviews the mask design used for the internal metrology of the Space Interferometry Mission (SIM). Included is information about the project, the method of measurements with SIM, the internal metrology, numerical model of internal metrology, wavefront examples, performance metrics, and mask design
Document ID
20090020312
Acquisition Source
Jet Propulsion Laboratory
Document Type
Conference Paper
External Source(s)
Authors
Marx, David
(Jet Propulsion Lab., California Inst. of Tech. Pasadena, CA, United States)
Zhao, Feng
(Jet Propulsion Lab., California Inst. of Tech. Pasadena, CA, United States)
Korechoff, Robert
(Jet Propulsion Lab., California Inst. of Tech. Pasadena, CA, United States)
Date Acquired
August 24, 2013
Publication Date
May 23, 2005
Subject Category
Instrumentation And Photography
Meeting Information
Meeting: Conference on Lasers and Electro-Optics (CLEO)
Location: Baltimore, MD
Country: United States
Start Date: May 23, 2005
End Date: May 27, 2005
Distribution Limits
Public
Copyright
Other
Keywords
interferometry
internal metrology
Space Interferometry Mission (SIM)
diffraction

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