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Enabling High Performance Instruments for UV Astronomy and Space Exploration with ALDBenefits of Atomic Layer Deposition (ALD) for UV instruments and application are: (1) Ultrathin, highly conformal, and uniform films over arbitrarily large surface area (2) High quality films (density, roughness, conductivity, etc.) (3) Angstrom level control of stoichiometry, interfaces, and surface properties (3a) Multilayer nanolaminates/nanocomposites (3b) Low temperature surface engineering UV flight applications enabled by ALD. (1) Anti -reflective coatings/Mirrors/Filters/Optics for UV/Vis/NIR Detectors (2) Surface Passivation for III -N detectors
Document ID
20120013764
Acquisition Source
Jet Propulsion Laboratory
Document Type
Presentation
External Source(s)
Authors
Greer, F.
(Jet Propulsion Lab., California Inst. of Tech. Pasadena, CA, United States)
Hoenk, M. E.
(Jet Propulsion Lab., California Inst. of Tech. Pasadena, CA, United States)
Jones, T. J.
(Jet Propulsion Lab., California Inst. of Tech. Pasadena, CA, United States)
Jacquot, B. C.
(Jet Propulsion Lab., California Inst. of Tech. Pasadena, CA, United States)
Monacos, S.
(Jet Propulsion Lab., California Inst. of Tech. Pasadena, CA, United States)
Nikzad, S.
(Jet Propulsion Lab., California Inst. of Tech. Pasadena, CA, United States)
Hamden, E.
(Columbia Univ. NY, United States)
Schiminovich, D.
(Columbia Univ. NY, United States)
Date Acquired
August 26, 2013
Publication Date
June 27, 2011
Subject Category
Instrumentation And Photography
Meeting Information
Meeting: Atomic Layer Depostion 2011
Location: Cambridge, MA
Country: United States
Start Date: June 27, 2011
Distribution Limits
Public
Copyright
Other
Keywords
quantum efficiency
atomic layer deposition

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