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A Compendium of Scale Surface Microstructures: Ni(pt)al Coatings Oxidized at 1150 C for 2000 1-h CyclesThe surface structure of scales formed on Ni(Pt)Al coatings was characterized by SEM/EDS/BSE in plan view. Two nominally identical {100} samples of aluminide coated CMSX4 single crystal were oxidized at 1150 C for 2000 1-h cycles and were found to produce somewhat disparate behavior. One sample, with less propensity for coating grain boundary ridge deformation, presented primarily alpha-Al2O3 scale structures, with minimal weight loss and spallation. The original scale structure, still retained over most of the sample, consisted of the classic theta-alpha transformation-induced ridge network structure, with approx. 25 nm crystallographic steps and terraces indicative of surface rearrangement to low energy alumina planes. The scale grain boundary ridges were often decorated with a fine, uniform distribution of (Hf,Ti)O2 particles. Another sample, producing steady state weight losses, exhibited much interfacial spallation and a complex assortment of different structures. Broad areas of interfacial spalling, crystallographically-faceted (Ni,Co)(Al,Cr)2O4 spinel, with an alpha-Al2O3 base scale, were the dominant features. Other regions exhibited nodular spinel grains, with fine or (Ta,Ti)-rich (rutile) particles decorating or interspersed with the spinel. While these features were consistent with a coating that presented more deformation at extruded grain boundaries, the root cause of the different behavior between the duplicate samples could not be conclusively identified.
Document ID
20140013153
Acquisition Source
Glenn Research Center
Document Type
Technical Memorandum (TM)
Authors
Smialek, James L.
(NASA Glenn Research Center Cleveland, OH, United States)
Garg, Anita
(Toledo Univ. Toledo, OH, United States)
Date Acquired
October 23, 2014
Publication Date
February 1, 2010
Subject Category
Metals And Metallic Materials
Report/Patent Number
NASA/TM-2010-216091
E-17136
Funding Number(s)
WBS: WBS 984754.02.07.03.16.02
Distribution Limits
Public
Copyright
Public Use Permitted.
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