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Fabrication of Electrostatically Actuated Microshutters ArraysA new fabrication process has been developed to actuate microshutter arrays (MSA) electrostatically at NASA Goddard Space Flight Center. The microshutters, made with silicon nitride membranes with a pixel size of 100 x 200 sq microns, rotate on torsion bars. The microshutters are actuated, latched, and addressed electrostatically by applying voltages on the electrodes the front and back sides of the microshutters. The atomic layer deposition (ALD) of aluminum oxide was used to insulate electrodes on the back side of walls; the insulation can withstand over 100 V. The ALD aluminum oxide is dry etched, and then the microshutters are released in vapor HF.
Document ID
20160006596
Acquisition Source
Goddard Space Flight Center
Document Type
Reprint (Version printed in journal)
Authors
Oh, L.
(SGT, Inc. Greenbelt, MD, United States)
Li, M.
(NASA Goddard Space Flight Center Greenbelt, MD United States)
Kelly, D.
(ASRC Federal Space and Defense Greenbelt, MD, United States)
Kutyrev, A.
(Maryland Univ. College Park, MD, United States)
Moseley, S.
(NASA Goddard Space Flight Center Greenbelt, MD United States)
Date Acquired
May 25, 2016
Publication Date
June 13, 2016
Publication Information
Publisher: Messe Breman
Subject Category
Electronics And Electrical Engineering
Report/Patent Number
GSFC-E-DAA-TN32161
Meeting Information
Meeting: Actuator 2016 Conference
Location: Bremen
Country: Germany
Start Date: June 13, 2016
End Date: June 15, 2016
Funding Number(s)
CONTRACT_GRANT: NNG13CR48C
CONTRACT_GRANT: NNG06EO90A
Distribution Limits
Public
Copyright
Other
Keywords
microshutter arrays (MSA)

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