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A Broadband Micro-Machined Far-Infrared AbsorberThe experimental investigation of a broadband far-infrared meta-material absorber is described. The observed absorptance is greater than 0.95 from 1 to 20 terahertz (300-15 microns) over a temperature range spanning 5-300 degrees Kelvin. The meta-material, realized from an array of tapers approximately 100 microns in length, is largely insensitive to the detailed geometry of these elements and is cryogenically compatible with silicon-based micro-machined technologies. The electromagnetic response is in general agreement with a physically motivated transmission line model.
Document ID
20160007471
Acquisition Source
Goddard Space Flight Center
Document Type
Reprint (Version printed in journal)
External Source(s)
Authors
Wollack, E. J.
(NASA Goddard Space Flight Center Greenbelt, MD United States)
Datesman, A. M.
(SGT, Inc. Greenbelt, MD, United States)
Jhabvala, C. A.
(NASA Goddard Space Flight Center Greenbelt, MD United States)
Miller, K. H.
(NASA Goddard Space Flight Center Greenbelt, MD United States)
Quijada, M. A.
(NASA Goddard Space Flight Center Greenbelt, MD United States)
Date Acquired
June 13, 2016
Publication Date
May 2, 2016
Publication Information
Publication: Review of Scientific Instruments
Publisher: AIP
Volume: 87
Issue: 5
Subject Category
Instrumentation And Photography
Report/Patent Number
GSFC-E-DAA-TN32422
Funding Number(s)
CONTRACT_GRANT: NNG13CR48C
Distribution Limits
Public
Copyright
Other
Keywords
broadband far-infrared meta-material absorber
absorptance
silicon-based micro-machined technologies

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