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Semiconductor wafer improvement through photoengraving Final report, 1 Mar. - 1 Jul. 1965Etching resist as masking agent in photoengraving silicon semiconductor wafers and process specifications
Document ID
19660006697
Acquisition Source
Legacy CDMS
Document Type
Contractor Report (CR)
Authors
Taylor, C. J. (Westinghouse Electric Corp. Baltimore, MD, United States)
Date Acquired
August 3, 2013
Publication Date
January 1, 1965
Subject Category
Machine Elements And Processes
Report/Patent Number
NASA-CR-69678
Report Number: NASA-CR-69678
Accession Number
66N15986
Funding Number(s)
CONTRACT_GRANT: NAS5-3758
Distribution Limits
Public
Copyright
Work of the US Gov. Public Use Permitted.
Keywords
PHOTOENGRAVING
SILICON
SEMICONDUCTOR
ETCHING

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