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Profiling procedures. 1: Anodic oxidation. 2: OLS profile programInstructions for use of anodic oxidation apparatus in conjunction with computer program to obtain electrically active concentration profiles of doped silicon wafers
Document ID
19710024940
Acquisition Source
Legacy CDMS
Document Type
Contractor Report (CR)
Authors
Motamedi, H. M. (California Univ. Santa Barbara, CA, United States)
Date Acquired
August 6, 2013
Publication Date
January 1, 1971
Subject Category
Machine Elements And Processes
Report/Patent Number
NASA-CR-119799
Report Number: NASA-CR-119799
Accession Number
71N34416
Funding Number(s)
CONTRACT_GRANT: NGR-05-010-041
Distribution Limits
Public
Copyright
Work of the US Gov. Public Use Permitted.

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