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X-ray reflection and scatter measurements on selected optical samplesThe results from an experimental program to determine the reflection efficiency and scatter parameters of selected optical samples are presented. The measurements were made using 8.34A X-rays at various angles of incidence. Selected samples were contaminated after being measured and then remeasured to determine the effects of contamination. The instrumentation involved in taking the data, including the X-ray reflectometer and data processing equipment, is discussed in detail. The condition of the optical surfaces, the total reflection measurements, the scatter measurements, and the analysis are discussed.
Document ID
19760009830
Acquisition Source
Legacy CDMS
Document Type
Technical Memorandum (TM)
Authors
Fields, S. A. (NASA Marshall Space Flight Center Huntsville, AL, United States)
Reynolds, J. M. (NASA Marshall Space Flight Center Huntsville, AL, United States)
Holland, R. L. (NASA Marshall Space Flight Center Huntsville, AL, United States)
Date Acquired
September 3, 2013
Publication Date
November 1, 1975
Subject Category
Optics
Report/Patent Number
NASA-TM-X-64974
Report Number: NASA-TM-X-64974
Accession Number
76N16918
Distribution Limits
Public
Copyright
Work of the US Gov. Public Use Permitted.

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