NASA Logo

NTRS

NTRS - NASA Technical Reports Server

Back to Results
Float-zone processing in a weightless environmentThe results were reported of investigations to: (1) test the validity of analyses which set maximum practical diameters for Si crystals that can be processed by the float zone method in a near weightless environment, (2) determine the convective flow patterns induced in a typical float zone, Si melt under conditions perceived to be advantageous to the crystal growth process using flow visualization techniques applied to a dimensionally scaled model of the Si melt, (3) revise the estimates of the economic impact of space produced Si crystal by the float zone method on the U.S. electronics industry, and (4) devise a rational plan for future work related to crystal growth phenomena wherein low gravity conditions available in a space site can be used to maximum benefit to the U.S. electronics industry.
Document ID
19770006011
Acquisition Source
Legacy CDMS
Document Type
Contractor Report (CR)
Authors
Fowle, A. A.
(Little (Arthur D.), Inc. Cambridge, MA, United States)
Haggerty, J. S.
(Little (Arthur D.), Inc. Cambridge, MA, United States)
Perron, R. R.
(Little (Arthur D.), Inc. Cambridge, MA, United States)
Strong, P. F.
(Little (Arthur D.), Inc. Cambridge, MA, United States)
Swanson, J. L.
(Little (Arthur D.), Inc. Cambridge, MA, United States)
Date Acquired
September 3, 2013
Publication Date
November 1, 1976
Publication Information
Publisher: NASA
Subject Category
Space Sciences (General)
Report/Patent Number
M-190
NASA-CR-2768
Accession Number
77N12954
Funding Number(s)
CONTRACT_GRANT: NAS8-29877
Distribution Limits
Public
Copyright
Work of the US Gov. Public Use Permitted.
No Preview Available