Measurement of opaque film thickness

The theoretical and experimental framework for thickness measurements of thin metal films by low frequency thermal waves is described. Although it is assumed that the films are opaque and the substrates are comparatively poor thermal conductors, the theory is easily extended to other cases of technological interest. A brief description is given of the thermal waves and the experimental arrangement and parameters. The usefulness of the technique is illustrated for making absolute measurements of the thermal diffusivities of isotropic substrate materials. This measurement on pure elemental solids provides a check on the three dimensional theory in the limiting case of zero film thickness. The theoretical framework is then presented, along with numerical calculations and corresponding experimental results for the case of copper films on a glass substrate.