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Prognostics of Power MOSFETThis paper demonstrates how to apply prognostics to power MOSFETs (metal oxide field effect transistor). The methodology uses thermal cycling to age devices and Gaussian process regression to perform prognostics. The approach is validated with experiments on 100V power MOSFETs. The failure mechanism for the stress conditions is determined to be die-attachment degradation. Change in ON-state resistance is used as a precursor of failure due to its dependence on junction temperature. The experimental data is augmented with a finite element analysis simulation that is based on a two-transistor model. The simulation assists in the interpretation of the degradation phenomena and SOA (safe operation area) change.
Document ID
20110014337
Acquisition Source
Ames Research Center
Document Type
Conference Paper
Authors
Celaya, Jose Ramon
(Stinger Ghaffarian Technologies, Inc. (SGT, Inc.) Moffett Field, CA, United States)
Saxena, Abhinav
(Stinger Ghaffarian Technologies, Inc. (SGT, Inc.) Moffett Field, CA, United States)
Vashchenko, Vladislay
(Stinger Ghaffarian Technologies, Inc. (SGT, Inc.) Moffett Field, CA, United States)
Saha, Sankalita
(MCT, Inc. Moffett Field, CA, United States)
Goebel, Kai Frank
(NASA Ames Research Center Moffett Field, CA, United States)
Date Acquired
August 25, 2013
Publication Date
May 23, 2011
Subject Category
Electronics And Electrical Engineering
Report/Patent Number
ARC-E-DAA-TN3466
Meeting Information
Meeting: International Symposium on Power Semiconductor Devices
Location: San Diego, CA
Country: United States
Start Date: May 23, 2011
End Date: May 26, 2011
Sponsors: Institute of Electrical and Electronics Engineers
Funding Number(s)
CONTRACT_GRANT: NNA08CG83C
Distribution Limits
Public
Copyright
Public Use Permitted.
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