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From Bench Top to Market: Growth of Multi-Walled Carbon Nanotubes by Injection CVD Using Fe Organometallics - Production of a Commercial ReactorPreferential oriented multiwalled carbon nanotubes were prepared by the injection chemical vapor deposition (CVD) method using either cyclopentadienyliron dicarbonyl dimer or cyclooctatetraene iron tricarbonyl as the iron catalyst source. The catalyst precursors were dissolved in toluene as the carrier solvent for the injections. The concentration of the catalyst was found to influence both the growth (i.e., MWNT orientation) of the nanotubes, as well as the amount of iron in the deposited material. As deposited, the multiwalled carbon nanotubes contained as little as 2.8% iron by weight. The material was deposited onto tantalum foil and fused silica substrates. The nanotubes were characterized by scanning electron microscopy, transmission electron microscopy, Raman spectroscopy and thermogravimetric analysis. This synthetic route provides a simple and scalable method to deposit MWNTs with a low defect density, low metal content and a preferred orientation. Subsequently, a small start-up was founded to commercialize the deposition equipment. The contrast between the research and entrepreneurial environments will be discussed.
Document ID
20130013149
Document Type
Presentation
Authors
Rowsell, J.
(Nanotech Innovations Oberlin, OH, United States)
Hepp, A. F.
(NASA Glenn Research Center Cleveland, OH, United States)
Harris, J. D.
(Northwest Nazarene Univ. Nampa, ID, United States)
Raffaelle, R. P.
(Rochester Inst. of Tech. Rochester, NY, United States)
Cowen, J. C.
(Nanotech Innovations Oberlin, OH, United States)
Scheiman, D. A.
(Nanotech Innovations Oberlin, OH, United States)
Flood, D. M.
(Nanotech Innovations Oberlin, OH, United States)
Flood, D. J.
(Nanotech Innovations Oberlin, OH, United States)
Date Acquired
August 27, 2013
Publication Date
March 18, 2009
Subject Category
Composite Materials
Report/Patent Number
E-17363
Funding Number(s)
WBS: WBS 22-708-87-09-(05)
Distribution Limits
Public
Copyright
Public Use Permitted.
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