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Infrared Contrast Analysis Technique for Flash Thermography Nondestructive EvaluationThe paper deals with the infrared flash thermography inspection to detect and analyze delamination-like anomalies in nonmetallic materials. It provides information on an IR Contrast technique that involves extracting normalized contrast verses time evolutions from the flash thermography infrared video data. The paper provides the analytical model used in the simulation of infrared image contrast. The contrast evolution simulation is achieved through calibration on measured contrast evolutions from many flat bottom holes in the subject material. The paper also provides formulas to calculate values of the thermal measurement features from the measured contrast evolution curve. Many thermal measurement features of the contrast evolution that relate to the anomaly characteristics are calculated. The measurement features and the contrast simulation are used to evaluate flash thermography inspection data in order to characterize the delamination-like anomalies. In addition, the contrast evolution prediction is matched to the measured anomaly contrast evolution to provide an assessment of the anomaly depth and width in terms of depth and diameter of the corresponding equivalent flat-bottom hole (EFBH) or equivalent uniform gap (EUG). The paper provides anomaly edge detection technique called the half-max technique which is also used to estimate width of an indication. The EFBH/EUG and half-max width estimations are used to assess anomaly size. The paper also provides some information on the "IR Contrast" software application, half-max technique and IR Contrast feature imaging application, which are based on models provided in this paper.
Document ID
Document Type
Other - Patent
Koshti, Ajay
(NASA Johnson Space Center Houston, TX, United States)
Date Acquired
October 2, 2014
Publication Date
September 11, 2014
Subject Category
Nonmetallic Materials
Instrumentation And Photography
Report/Patent Number
Distribution Limits
Work of the US Gov. Public Use Permitted.
Patent US 8,577,120
Patent Application
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