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Development and Testing of a High-Precision Position and Attitude Measuring System for a Space MechanismThis paper describes a high-precision optical metrology system - a unique ground test equipment which was designed and implemented for simultaneous precise contactless measurements of 6 degrees-of-freedom (3 translational + 3 rotational) of a space mechanism end-effector [1] in a thermally controlled ISO 5 clean environment. The developed contactless method reconstructs both position and attitude of the specimen from three cross-sections measured by 2D distance sensors [2]. The cleanliness is preserved by the hermetic test chamber filled with high purity nitrogen. The specimen's temperature is controlled by the thermostat [7]. The developed method excludes errors caused by the thermal deformations and manufacturing inaccuracies of the test jig. Tests and simulations show that the measurement accuracy of an object absolute position is of 20 micron in in-plane measurement (XY) and about 50 micron out of plane (Z). The typical absolute attitude is determined with an accuracy better than 3 arcmin in rotation around X and Y and better than 10 arcmin in Z. The metrology system is able to determine relative position and movement with an accuracy one order of magnitude lower than the absolute accuracy. Typical relative displacement measurement accuracies are better than 1 micron in X and Y and about 2 micron in Z. Finally, the relative rotation can be measured with accuracy better than 20 arcsec in any direction.
Document ID
20160008151
Acquisition Source
Ames Research Center
Document Type
Conference Paper
Authors
Khanenya, Nikolay
(Almatech Lausanne, Switzerland)
Paciotti, Gabriel
(Almatech Lausanne, Switzerland)
Forzani, Eugenio
(Almatech Lausanne, Switzerland)
Blecha, Luc
(Almatech Lausanne, Switzerland)
Date Acquired
June 30, 2016
Publication Date
May 4, 2016
Publication Information
Publication: 43rd Aerospace Mechanisms Symposium
Subject Category
Mechanical Engineering
Ground Support Systems And Facilities (Space)
Distribution Limits
Public
Copyright
Public Use Permitted.
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