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Modified developer increases line resolution in photosensitive resistStandard developer solution is mixed with dipropyl carbonate. This reduces swelling in the photosensitive resist and permits application of relatively thick films with minimal pinhole formation and increased line resolution.
Document ID
19650000276
Acquisition Source
Legacy CDMS
Document Type
Other - NASA Tech Brief
Date Acquired
August 2, 2013
Publication Date
September 1, 1965
Subject Category
Electronic Components And Circuits
Report/Patent Number
GSC-386
Report Number: GSC-386
Accession Number
65B10278
Funding Number(s)
CONTRACT_GRANT: NAS5-3758
Distribution Limits
Public
Copyright
Work of the US Gov. Public Use Permitted.

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