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The ternary system tantalum-hafnium-carbon at 2050 deg cIsothermal cross section of tantalum-hafnium- carbon at high temperatures constructed from X-ray diffraction, chemical analysis, and metallographic and microhardness data
Document ID
19650012138
Acquisition Source
Legacy CDMS
Document Type
Other - NASA Technical Note (TN)
Authors
Deadmore, D. L. (NASA Lewis Research Center Cleveland, OH, United States)
Zaplatynsky, I. (NASA Lewis Research Center Cleveland, OH, United States)
Date Acquired
September 2, 2013
Publication Date
April 1, 1965
Subject Category
Materials, Metallic
Report/Patent Number
NASA-TN-D-2768
Report Number: NASA-TN-D-2768
Accession Number
65N21739
Distribution Limits
Public
Copyright
Work of the US Gov. Public Use Permitted.
Keywords
ISOTHERMAL LAYER
CARBON
HAFNIUM
METALLOGRAPHY
X-RAY DIFFRACTION
CHEMICAL ANALYSIS
TANTALUM

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