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Vaporization of tantalum carbide-hafnium carbide solid solutions at 2500 deg to 3000 deg kVaporization rates in vacuum of hot pressed hafnium carbide and tantalum carbide at 3000 deg K
Document ID
19650025651
Acquisition Source
Legacy CDMS
Document Type
Technical Memorandum (TM)
Authors
Deadmore, D. L. (NASA Lewis Research Center Cleveland, OH, United States)
Date Acquired
September 2, 2013
Publication Date
January 1, 1964
Subject Category
Chemistry
Report/Patent Number
NASA-TM-X-52014
Report Number: NASA-TM-X-52014
Accession Number
65N35252
Distribution Limits
Public
Copyright
Work of the US Gov. Public Use Permitted.
Keywords
TANTALUM CARBIDE
VACUUM SYSTEM
HAFNIUM CARBIDE
VAPORIZATION HEAT

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