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Vapor grown silicon dioxide improves transistor base-collector junctionsVapor grown silicon dioxide layer protects base-collector junction in silicon planar transistors during the emitter diffusion process. This oxide fills in any imperfections that exist in the thermally grown oxide layer and is of greater thickness than that layer. This process is used to deposit protective silicon dioxide coatings on optical surfaces.
Document ID
19660000091
Acquisition Source
Legacy CDMS
Document Type
Other - NASA Tech Brief
Authors
Carley, D. R.
Duclos, R. A.
Date Acquired
August 3, 2013
Publication Date
March 1, 1966
Subject Category
Electronic Components And Circuits
Report/Patent Number
GSC-389
Report Number: GSC-389
Accession Number
66B10091
Distribution Limits
Public
Copyright
Work of the US Gov. Public Use Permitted.
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