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The part played by oxygen in the structural changes of silicon single crystals during thermal treatmentInfluence of oxygen on structure of silicon single crystals during short and prolonged heat treatment
Document ID
19670021540
Acquisition Source
Legacy CDMS
Document Type
Technical Translation (TT)
Authors
Iglitsyn, M. I.
Kekelidze, G. P.
Layner, L. V.
Milvidskiy, M. G.
Date Acquired
August 3, 2013
Publication Date
July 1, 1967
Subject Category
Physics, Solid-State
Report/Patent Number
NASA-TT-F-11083
Report Number: NASA-TT-F-11083
Accession Number
67N30869
Distribution Limits
Public
Copyright
Public Use Permitted.
Keywords
SINGLE CRYSTAL
CRYSTAL STRUCTURE
SILICON
OXYGEN
HEAT TREATMENT
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